A contract for the supply of the first domestic installation for alignment and projection exposure (photolithographer) with a resolution of 350 nm was signed at the Russian forum "Microelectronics 2025." The contract was concluded between the Zelenograd Nanotechnology Center (ZNTC) and "Industry Solutions" (part of the Element group of companies).
Today, we are laying the foundation for a new stage in the development of domestic microelectronics. The ZNTC has completed the development of an installation for alignment and projection exposure with a resolution of 350 nm, its parameters have been confirmed at the production site, and the transition to mass production is underway. This is the first step in creating a line of Russian lithographers. A serious foundation has been created, which allows us to move on to the development of fully localized installations with 90 nm standards.
The ZNTC photolithographer is designed for projection transfer of a photomask image onto a semiconductor wafer and its multiplication on the wafer during the manufacture of a very large integrated circuit with a design topological norm of 350 nm. The contract includes the supply, installation and commissioning of equipment.
This installation was created as part of the implementation of one of the first projects of the state program for localizing the technological chain of microcircuit production with topological standards of 350-130 nm. It will be used to modernize existing and equip new microelectronic production facilities. The development and production of the photolithographer were carried out in partnership with the Belarusian OJSC "Planar."
Earlier, www1.ru reported that the first photolithographer in Russia with a resolution of 350 nanometers was developed in Zelenograd.
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