The project of the X-ray lithograph "Orel-7" was presented at Novosibirsk State University. The installation is planned to be integrated into the infrastructure of the SKIF synchrotron, which is expected to be launched in 2026.
According to the developers, the complex will overcome the technological limit of 28 nm in microelectronics and create the basis for the production of new-level Russian processors.
The transition to shorter-wave radiation, including the X-ray range, will increase the resolution of lithography and make it possible to form ultra-miniature structures with high precision.
SKIF will be the first fourth-generation synchrotron radiation source in Russia. Its parameters allow obtaining data on the structure of matter at the atomic level.
The creation of a specialized X-ray station for microelectronics tasks is seen as a step towards the formation of a sovereign technological chain for chip production.
Russia in 2026 re-entered the limited circle of states capable of producing equipment for electronic engineering, emphasized First Deputy Prime Minister Denis Manturov. There are only three such countries in the world.
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- Russian Printed Circuit Boards and 200 Nanometer Topology Lithograph: "Beshtau" and "RostIntech" Create New Production
