Zelenograd Nanotechnology Center (ZNTC) has announced the completion of the development of the first Russian photolithographer. This installation is capable of creating microchips with a resolution of 350 nanometers.
The new lithographer has a number of advantages compared to previous developments. The area of the working field has been increased to 22x22 mm (instead of 3.2x3.2 mm), and the maximum diameter of processed wafers has increased to 200 mm (from 150 mm). For the first time in a Russian lithographer, a more powerful and durable solid-state laser was used as a radiation source instead of a mercury lamp.
Currently, the center is adapting technological processes to the needs of end users and is negotiating the supply of the first installations for the modernization of existing and equipping new microelectronic production facilities. One of the potential customers is Micron. ZNTC also plans to complete the development of a lithographer with a resolution of 130 nm by 2026.
Earlier www1.ru reported that the first Russian lithographer at 350 nanometers went on testing.
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