Specialists from the Zelenograd Nanotechnology Center (ZNTC), together with colleagues from Planar (Belarus), have developed the first 350 nm topology photolithographer in Russia. This is a key piece of equipment for the production of microchips, the center's press service reported.
The new joint development has a number of advantages: the working field area has been significantly increased – 22x22 mm compared to the previous 3.2x3.2 mm, the maximum diameter of processed wafers is one step larger – 200 mm instead of 150 mm.
Kovalev stated that in other countries, a mercury lamp is used as a radiation source for the production of lithographs. Russian engineers used a solid-state laser, which is characterized by increased power, durability and a narrower spectrum, he added.
ZNTC is also developing an alignment and projection exposure system with a resolution of 130 nm. The work will be completed in 2026.
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