The idea is to develop a new radiation source in the extreme ultraviolet (EUV) wavelength range by adding lithium to a helium plasma charge. An experimental complex and a radiation source based on it were developed by a team of scientists at the Department of General Physics and Nuclear Fusion of the National Research University "MPEI".
The university's press service notes that the new source has increased efficiency compared to existing EUV radiation sources.
Experiments with the addition of lithium to a helium plasma discharge have shown the possibility of creating a stationary source in demand by EUV lithography technology, which is used in microelectronics to reduce the characteristic dimensions of circuit elements, as a result of which their speed increases and the size of the product decreases.
With the help of this and other new solutions, the university hopes to help the Russian production of integrated circuit elements for microelectronics and solve the common problems of Russia's technological sovereignty.
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