Scientists from Novosibirsk State Technical University (NSTU), together with the Institute of Automation and Electrometry SB RAS, have developed a method for creating multilayer diffraction gratings for the near-infrared range. As reported by TASS in the NSTU press service, a four-stage cycle — electron beam dielectric deposition, chromium application, laser writing, and ion processing — has been replaced by a simpler technology.
Typically, to form a relief on holograms, the material sequentially went through all stages. The new approach is based on optimizing the structure and composition of the multilayer coating. Developer Victoria Zaitseva explained: it has been found possible to obtain a uniform etching depth while simultaneously reducing reflection from the diffractive structure. This allows for the production of Dammann gratings — optical elements that split a laser beam into several beams of equal intensity or form a given spatial beam structure.
Simplifying the technological cycle creates a basis for scaling up the production of elements in holographic, telecommunication, and metrological equipment. For parallel laser micromachining, wavelength multiplexing in optical fiber, and multi-beam interferometers, reducing energy losses is critical, and the elegant production method replaces a complex multi-stage process. This reduces the cost and dependence on imported equipment for laser communication, eliminating unnecessary interfaces where parasitic light previously interfered. The product becomes not only more accessible but also more accurate.